InP

As one of the most important compound semiconductor materials, Indium phosphide (InP) single crystal materials are key materials for the production of InP-based laser diodes (LD), light-emitting diodes (LEDs) and photodetectors in optical communications. These devices realize the emission of information in optical fiber communications, Dissemination, amplification, acceptance and other functions. InP is also very suitable for high-frequency devices, such as high electron mobility transistors (HEMT) and heterojunction bipolar transistors (HBT). Due to its superior characteristics, it is used in optical fiber communication, microwave, millimeter wave, Many high-tech fields such as radiant solar cells and heterojunction transistors. The main growth methods of InP single crystal materials include traditional liquid-sealed Czochralski technology (LEC), improved LEC technology, and gas pressure controlled Czochralski technology (VCZ). /PC-LEC)/Vertical Gradient Solidification Technology (VGF)/Vertical Bridgman Technology (VB), etc.

CasCrysTech (CCT) provides high quality Indium phosphide (InP) crystal which can be customized upon customer's requirements.

Uses/Applications

Key materials for the production of InP-based laser diodes (LD), light-emitting diodes (LEDs) and photodetectors in optical communications.
Suitable for high-frequency devices, such as high electron mobility transistors (HEMT) and heterojunction bipolar transistors (HBT).

Features/Benefits

Indium phosphide (InP) includes phosphorus and indium and is a binary semiconductor. It has a zincblende crystal structure similar to GaAs and almost all the III-V semiconductors.

  • Crystal

    Structure

    Crystal Orientation

    Melting Point oC

    Density g/cm3

    Forbidden Band Width

    InP

    Cubic,

    a=5.869 Å

    <100>

    1600

    4.79

    1.344

    Parameters

    Single Crystal

    Dopant

    Conduction Type

    Carrier Concentration

    cm-3

    Mobility (cm2/V.s)

    Dislocation density (cm-2)

    Standard Substrate

    InP

    Undoped

    N

    (0.4-2)´1016

    (3.5-4)´103

    £5´104

    Φ2″×0.35mm

    Φ3″×0.35mm

    InP

    S

    N

    (0.8-3)´1018

    (4-6)´1018

    (2.0-2.4)´103

    (1.3-1.6)´103

    £ 3´104

    £2´103

    Φ2″×0.35mm

    Φ3″×0.35mm

    InP

    Zn

    P

    (0.6-2) ´1018

    70-90

    £ 2´104

    Φ2″×0.35mm

    Φ3″×0.35mm

    InP

    Te

    N

    107-108

    ³2000

    £3´104

    Φ2″×0.35mm

    Φ3″×0.35mm

    Dimension

    Dia50.8x0.35mm,10×10×0.35mm10×5×0.35mm

    Orientation and size can be customized.

    Surface Roughness

    Surface roughness(Ra):<=5 Å
    Atomic particle microscope ( AFM ) test report can be provided

    Polishing

    One side or two sides

    Package

    Class 100 clean bag, Class 1000 super clean room


  • Dimension

    Φ 50.8x0.35mm,10×10×0.35mm、10×5×0.35mm

    Customized upon request.